China reportedly set to supply domestic DUV lithography equipment
Translated from Korean, summarized and contextualized by DistantNews.
At a glance
- China is reportedly developing and preparing to supply its own immersion DUV lithography equipment for semiconductor manufacturing.
- This move signifies a step towards self-sufficiency in semiconductor production, particularly as the U.S. restricts exports of advanced equipment to China.
- While China aims to increase production, its domestically produced equipment is expected to lag behind global leaders like ASML in performance and reliability for the foreseeable future.
China appears to be making significant strides in its quest for semiconductor self-sufficiency with reports indicating the development and upcoming supply of its own immersion Deep Ultraviolet (DUV) lithography equipment. This development comes at a critical juncture as the United States tightens restrictions on the export of advanced semiconductor manufacturing tools to China.
According to reports citing U.S. tech media, Chinese-made immersion DUV lithography equipment is slated for delivery to major domestic chipmakers, including SMIC, Hua Hong Semiconductor, and CXMT, within the current year. The equipment is being produced by a government-backed entity, though its specific name has not been disclosed. Immersion DUV lithography is a crucial process for etching intricate circuit patterns onto silicon wafers, essential for manufacturing semiconductors.
Chinese-made immersion DUV lithography equipment is scheduled to be supplied to SMIC, Hua Hong Semiconductor, and CXMT within this year.
While the exact production numbers are modest, with an estimated five units planned for this year and a target of 20 units annually by 2027, this domestic capability represents a notable advancement. However, the Chinese-made equipment is understood to still face a performance and reliability gap compared to the industry-leading systems from ASML of the Netherlands. Further testing and adjustments will be necessary before these machines can be reliably integrated into mass production lines.
This domestic production could partially offset the impact of U.S. export controls, which have increasingly targeted advanced lithography tools. Notably, the Netherlands has implemented export restrictions on extreme ultraviolet (EUV) lithography equipment since 2019 and, starting September 2024, will require government permits for exporting DUV equipment, aligning with U.S. pressure. Although not all older or lower-specification DUV equipment is banned, the focus on advanced tools highlights the ongoing technological race. Speculation points to Shanghai-based SMEE (Shanghai Micro Electronics Equipment) as a potential manufacturer, with ties to companies like Simgui Semiconductor.
The performance and reliability gap compared to the products of ASML, the world's largest lithography equipment manufacturer, still exists.
Originally published by Hankyoreh in Korean. Translated, summarized, and contextualized by our editorial team with added local perspective. Read our editorial standards.