Samsung Electronics and ASML join forces on large-mask consortium for advanced chipmaking
Translated from Korean and summarized by DistantNews. Read the original for the full story.
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- Samsung Electronics will join an ASML-led consortium developing 12-inch photomask technology for advanced semiconductor manufacturing.
- Larger photomasks could expose wider circuit areas at once, reducing processing burdens, defect rates and costs.
Samsung Electronics plans to join a large-mask consortium led by Dutch semiconductor equipment maker ASML, aiming to strengthen its advanced manufacturing capabilities.
The group will jointly develop next-generation technology to expand photomasks from their current 6-inch size to 12 inches. Photomasks carry the circuit patterns that manufacturers transfer onto wafers during semiconductor production.
The mask functions much like photographic film. Light passes through its pattern to print the circuitry onto the wafer, making it essential to advanced processes.
The consortium is focused on replacing the 6-inch photomasks used in lithography for decades. A larger mask can cover a wider circuit area in a single operation, reducing the need to divide patterns and connect them later. That could lower process defect rates and production costs.
About this summary
Originally published by Dong-A Ilbo in Korean. Translated, summarized, and contextualized automatically by DistantNews, with a note on how the source frames the story. Not individually reviewed before publishing. How this works.
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